CASE.EDU:    HOME | DIRECTORIES | SEARCH
case western reserve university

MicroFabrication Laboratory

 

MFL Facilities

The MFL is approximately 5500 sq. ft. in size, about half of which is Class 100 cleanroom space. Click on links below to explore the different equipment available for processing.    
Metrology:    

Ergolux Research Microscope with Digital Camera, Leitz/Nuhsbaum

Nanospec Film Measurement System, NanoMetrics

Auto Production Ellipsometer, Rudolph Research
Film Stress measurement, Toho Dektak Surface Profilometer, Veeco Resistance Mapping System, Tencor
Thin Film Depostition:    

4-Stack Welded Frame Furnace System x3, MRL Industries

Silicon Nitride
Stoichiometric and Low-Stress
Polysilicon
In Situ Phosphorus-Doped Polysilicon
Low Temperature Oxide (LTO)
Phosphosilicate glass (PSG)
Wet and Dry Thermal Oxidation
Annealing
Sintering
Solid Source Boron Diffusion
Doped drive in

Discovery24 Magnetron Sputtering System, Denton Vacuum UltraDep1000 PECVD System, Group Sciences Inc  
Photolithography:    
Contact Aligner MA6/BA6, Karl Suss PhotoResist Spinner, Solitec Single Wafer Spin Processor, Laurell Technologies
Vacuum Bake/Vaqpor Prime System, Yield Engineering Systems Mechanical Convection Oven, Lindberg/Blue M Quartzware Cleaning System, Poly-Flow  
Etch:    
Lam490, Lam Research Macro-RIE 8000, Technics Plasma Processing System M4L, Metroline In
Wafer Bonding:    
Ev501 Wafer Bonder, EV Group